Optical frequency combs are spectra which consist of equidistant frequency lines, have revolutionized precision metrology and timekeeping since their invention about 20 years ago. Conventionally, optical frequency combs based on mode locked lasers were restricted to specialized labs, but with recent advancements in nanofabrication, frequency combs can now be created in chip scale microresonators (microcombs). Silicon nitride (SiN) is a popular platform for microcombs because it allows geometric dispersion control, has a wide transparency range and high non-linear index to support comb generation. Dispersion engineering requires waveguides that are hundreds of nanometers thick. However, SiN is highly resistant to most etch recipes, which makes it very difficult to fabricate silicon nitride resonators using subtractive processes where waveguides are transferred in silicon nitride via etching using a protective mask. Therefore, a mask of sufficient thickness or hardness is required to endure the etch process. In this work, we present two methods to fabricate thick SiN waveguide resonators, one using a polymer-based electron beam resist 'soft' mask and the other using a metallic (chromium) 'hard' mask. We discuss the advantages and drawbacks to using both processes and is capable of producing devices with mean intrinsic quality factor of 1M. This work illustrates two robust methods for the fabrication of microring resonators and lays the foundation for future fabrication of nonlinear photonic devices.